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Nano- and microfabrication

In December 2008 the cleanroom was inaugurated and is now offering a wide range of processing facilities as well as characterization facilities, among those are:

• Photolithography
• Electron Beam Lithography
• Nanoimprint lithography
• Thin-film deposition (e-beam evaporation and DC/RF sputtering)
• Silicon Nitride Low Pressure Chemical Vapour Deposition (for low-stress SiN thin films)
• Deep Reactive Ion Etching of Silicon
• Scanning Electron Microscopy
• Atomic Force Microscopy
• Interference Microscopy
• Profilometry
• Ellipsometry

A full list of the equipment including details on the facility can be found at:

The NanoSYD cleanroom facility is used frequently by NanoSYD researchers as well as other researchers at the university or by external partners and users.


For the publications in this field, please check the publications of the individual NanoSYD researchers (Find a researcher).


Contact person

Arkadiusz Goszczak, mail:


Mads Clausen Institute University of Southern Denmark

  • Alsion 2
  • Sønderborg - DK-6400
  • Phone: +45 6550 1690
  • Fax: +45 6550 1635

Last Updated 10.06.2024