Equipment and Services

Qx Shape Specifications

• Quick overview

  Specification	Value
  Surface roughness	Down to ≤ 5 nm
  Feature size control	Down to 100 nm
  Shape accuracy	Down to ≤ 200 nm
  Stitching-free part diameter	Up to 4,000 µm
  Maximum scan speed	6.25 m/s divided by lens magnification

  
  

• General System Properties

  Specification	Value
  Printing setup	Upright system enabling high-resolution 3D printing with flexible DiLL and non-DiLL setups to suit various material and application requirements
  Laser source	Femtosecond laser, 780 nm, average power 250 mW
  Laser safety	Class 1, IEC 60825-1
  Positioning volume	50 × 50 × 20 mm³
  Stage repeatability	≤ 150 nm
  Substrates	Microscope slides: 3″ × 1″ / 76 × 26 mm
  	Wafers: 1″ to 8″ / 25.4 to 200 mm
  	Flat substrates: up to 100 × 100 mm²
  	Dishes: 35 or 50 mm
  	Glass, silicon, and other transparent or opaque materials
  Photoresins	Nanoscribe photoresins for polymer printing
  	Nanoscribe GP-Silica for glass printing
  	Open to third-party or custom materials

  
  

• Print Head Specific Properties

  Feature Category	Small Features	Medium Features	Large Features	Extra Large Features
  Magnification / NA	63× / 1.4, 1.46	25× / 0.8	10× / 0.3	5× / 0.16
  Print mode	Dip-in²	Dip-in²	Dip-in²	Air
  Working distance	360 µm	380 µm	2,600 µm	18,500 µm
  Field of view diameter, maximum	400 µm	800 µm	2,300 µm	5,000 µm
  Calibrated print field diameter	270 µm	700 µm	1,750 µm	3,500 µm
  Scan speed, maximum	100 mm/s	250 mm/s	625 mm/s	1,250 mm/s
  Voxel size, xy / z, typical	0.2 / 0.5 µm	0.6 / 3.6 µm	1.2 / 12 µm	2 / 40 µm
  Slicing distance, typical range	0.1–0.8 µm	0.5–3 µm	2–10 µm	5–100 µm

  
  

• Application Sets – Chip Printing Set

  Specification	Details
  Key process	Automated printing aligned to fiducials and chip edges
  Alignment system	Confocal detection of fiducials and 3D topographies
  Detection accuracy in x/y direction	≤ 100 nm¹
  Compatible form factors	Unmounted with flat bottom; TO cans; others on request
  Compatible substrate materials	Silicon, SiP, SoI, SiN, InP, polymers, glass, and others on request
  Fiducial detection	Pattern matching, such as crosshairs, double squares, and circles
  Required index contrast	Fiducial/surrounding material > 0.02
  Printing to chip edges	Automatic chip-edge detection and laser-power compensation

  
  

• Application Sets – Bioprinting Set

  Specification	Details
  Temperature	Up to 50 °C; stability ± 0.5 °C
  Humidity control range	55–90% RH at 37 °C; stability ± 1% RH
  Gas flow	HEPA-filtered air with exchangeable filters
  External gas supply	Connection for an external supply of premixed CO₂ - will become available starting from 2028.
  Compatible substrates	Glass-bottom cell-culture imaging dishes, 35 mm or 50 mm
  Reliable results	Sterilizable parts; sterile consumables and biomaterials; sensor and video data collection
  Bioprinting Model Library	Access to verified, ready-to-use designs for common structures and applications

  
  

• Nanoscribe IP Series Resins

  2PP resin	Refractive index	Characteristics	Print Set	Substrate
  IP-Dip2	1.526	High resolution	SF [QX]	Fused silica, silicon, other substrates
  IP-L	1.485	High resolution	3D SF Oil, MF [QX]	Borosilicate, other substrates
  IP-G	1.495	High resolution; flying features	3D SF Oil	Borosilicate
  IP-S	1.486	High smoothness; meso-scale	MF [QX]	ITO-coated, silicon, other substrates
  IP-n162	1.604	High refractive index; reduced absorption in the 1200-1550 nm wavelength range	MF [QX]	Fused silica, Superfrost
  IP-PDMS	1.43	Highly flexible and elastic; non-cytotoxic; low refractive index	MF [QX]	ITO-coated, Superfrost
  IPX-Clear	1.523	High transmission; across print sets	SF [QX], MF [QX], LF [QX]	Fused silica, silicon, other substrates
  IPX-S	1.487	High smoothness; meso-scale	LF [QX]	Fused silica, silicon, other substrates
  IPX-Q	1.487	High photosensitivity; meso/macro-scale	LF [QX], XLF [QX]	Fused silica, silicon, other substrates
  IPX-M	1.496	Very high photosensitivity; macro-scale	XLF [QX]	Fused silica, silicon, other substrates

  
  

• Other possible biomaterial-based Resins (available upon order)

  2pp-resin	Refractive index	Characteristics	Print Set	Substrate
  Hydrobio INX N400	Not specified	Gelatin-based hydrogel; cell encapsulation during printing and cell seeding after	MF [QX]	Borosilicate
  Hydrobio INX N100	1.34	Gelatin-based hydrogel; cell interactive material	MF [QX]	Borosilicate
  Hydrotech INX N100	1.31	Mechanically robust hydrogel; non-biodegradable; biologically inert	MF [QX]	Borosilicate, other substrates [QX]
  Hydrotech INX N200	Not specified	Mechanically robust hydrogel; non-biodegradable; biologically inert; DiLL compatible	MF [QX]	Borosilicate, other substrates [QX]
  Degrad INX N100	1.51	Biodegradable	MF [QX]	Borosilicate, other substrates [QX]

   

  All specifications have been taken from the Nanoscribe website and the resin MSDS (which are available upon request).