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Advanced Imaging for Industry

Advanced imaging is used across different industrial and commercial applications. Two and three-dimensional images  at micro- and nano-scale provide insights into material characteristics, their changes over time, product failures and potential root causes. Advanced imaging contributes to  research, product development and prototyping, testing and quality control.

 

We offer especially to small and medium-sized companies an easy access to state-of-the-art facilities, imaging services and expert knowledge.

 

Applications

  • Semiconductors and microelectronics
  • Life Science
  • Food Industry
  • Material Sciences

Your road to advanced imaging

We assist you on your way to our imaging services. We keep all information confidential throughout our collaboration on your request.

 

  1. We discuss your specific problem together.

  2. We define the optimal imaging techniques and measurements.

  3. We agree on a project setting together (e.g. contract research, research collaboration or student collaboration).

  4. We carry out the measurements with your samples.

  5. You receive the data and expert’s report.

Test services now for free!

Are you interested to experience advanced imaging? We are looking for you! You can test now our services free of charge.

 

You benefit from public funding: Around 2 person days of our researchers can be financed, usually allowing to carry out complete measurements of samples depending on the complexity of the project.

  

Our instruments

Scanning Electron Microscopy and EDX

Scanning Electron Microscopy and EDX

The scanning electron microscope (SEM) combined with an electron diffraction spectroscopy (EDX) tool consist a strong and fast tool for analysis and characterization, providing both detailed images, elemental analysis and chemical composition at the same time.

 

Material science takes advantage of SEM for research, quality control and failure analysis. Various coatings, surfaces, materials can be inspected, and valuable information extracted. For example, Au evaporated material can be inspected for cluster dimensions and analysis of the coated material for contaminants.

 

Life sciences can strongly benefit from the SEM analysis as the equipment can be used for anything from insects and tissue, to bacteria and viruses. For example, an insect species can be analysed to determine the effect of climate change, or tissue inspection of tissue damage or fibrin network analysis.

 

The semiconductor industry takes advantage of the SEM capabilities for failure analysis of electronic devices and modules as it can provide high resolution images down to the nanoscale and inspect grain boundaries, fracture topographies, crack propagation, solder composition and quality analysis etc.

Moreover, the applications of the SEM are not limited only to those categories.

 

Instrument

Hitachi S-4800

Sample dimensions

Up to 100 mm

Resolutions

1 nm (Accelerating voltage: 15 kV, WD: 4 mm)

2.0 nm (Accelerating voltage: 1 kV, WD: 1.5 mm)

Magnification

High magnification mode: 100x to 800,000x

Low magnification mode: 30x to 2,000x

Energies

Accelerating voltage (Vacc): 0.5 to 30 kV (in 100 V steps)

Samples

Cross sectional mount, 10 mm round mount, 30 mm round mount, 100 mm round mount, EBL mount, preparation and measurement in Class 100 Cleanroom


Optical Profilometry

Optical Profilometry

Optical profilers are used for characterization of surface topography from 2D and 3D images. It is a rapid non-contact, non-destructive method for obtaining roughness statistics, feature analytical dimensions, defects, channel radius, three-dimensional visualization, etc.

Instrument

Fogale Microsurf 3D

Sample dimensions

Up to 100 mm

Vertical resolution

< 1 Å

Vertical measurement range

0.1 nm to 500 μm standard

RMS repeatability

0.3 nm RMS

Lateral spatial sampling

0.17 μm to 3.2 μm

Field of view

130 μm x 100 μm, 2.5 mm x 1.9 mm

Reflectivity

1 % to 100 %


Atomic Force Microscopy

Atomic Force Microscopy

An Atomic Force Microscope (AFM) uses an ultra-sharp tip in tapping mode to scan over a surface providing details on height, surface roughness and topography information of a material in the micro- and nanoscale. The high quality digital images obtained from the AFM can be used for post processing analysis of the area scanned, as well as two-dimensional and three-dimensional representation of the surface.

Instrument

Veeco Dimension 2100

Sample dimensions

Up to 120 mm x 100 mm

Characteristics of cantilever:

 

Microscopic spring of length

100 μm

Tip radius

R >> 10 nm

Force constant

k= 0.01 – 0.5 N/m

In our facilities we have two AFM instruments. The first one is a Veeco Dimension 2100 located in the cleanroom facilities for samples that are sensitive to contaminants and high quality scans. The second instrument is a JPK NanoWizard in our microscopy lab. The NanoWizard allows additionally: microscopy in liquids as it is combined with an inverted fluorescence microscope, force distance curve measurements, heatable sample stage and electrical scanning microscopy (EFM).


Helium Ion Microscopy

Helium Ion Microscopy


The Helium Ion Microscope (HIM) is a new instrument for ultra-high resolution imaging and nanofabrication. Its operation is similar to that of a scanning electron microscope (SEM) but in contrast the HIM exploits focused ion beams instead of an electron beam.

 

The imaging system of the HIM offers high material contrast, large focus depth, and surface sensitivity significantly superior to conventional SEM. The spatial resolution is in sub-nanometer range which is close to the resolution of transmission electron microscopes.

 

The HIM covers a broad range of applications in physics, material science, biology, and medicine, and can provide sub-10 nanometer nanofabrication and sub-nanometer imaging solutions for industrial and research application such as fabrication of superior photonic and plasmonic nanostructures and nano-pours in graphene for DNA sequencing.

 

More information can be found  here.

 


Cases

HIM analysis

HIM analysis – Helium ion images of Staphylococcus aureus for medical purposes

 


Optical profilometry

Optical profilometry - Depth cut analysis of Si wafer diced with the use of a diamond fine grid blade

 


SEM failure analysis

SEM - Failure analysis: Channel defect localization on a micro IC using SEM

No defect channels

Channels with defect


 With our equipment, we run various the imaging and analytical services, provide you with the data and consultancy with experts for specific materials, technology and application areas. We can also provide you access to additional complementary analytical facilities in our research network if needed.

More collaboration

Additionally, companies can benefit from a broad variety of opportunities to collaborate with us:

  

  • Educational activities (semester projects, bachelor and master thesis, internships, content of courses)
  • Research collaboration (funded R&D, PhD)
  • Contract research (measurements and analysis, testing, consulting, custom R&D, rent of equipment)

Contact us to learn more about these options and conditions. Many of these opportunities are free of charge for companies.


Your contact

 

Head of Clean Room
Arkadiusz J. Goszczak

Mads Clausen Institute

University of Southern Denmark

Alsion 2, 6400 Sønderborg, Denmark

E-mail: goszczak@mci.sdu.dk

Phone: +45 6550 1616

 



           

About us

The Mads Clausen Institute (MCI) is a partner for new ideas, technology and innovation. As part of the Faculty of Engineering at the University of Southern Denmark, MCI is located at the Danish-German border.

With more than 50 researchers and over 400 engineering students MCI is a gateway to advanced research, high-tech facilities, creative problem solving and contact to young talents. The competence areas include electronics, mechatronics, micro- and nanotechnology as well as technology entrepreneurship and innovation.

Some cooperation partners:

Aarhus University, Abengoa, Banke Accessory, Kiel University, Danfoss, DELTA, DTU, UC Berkeley, Embraer, Grundfos, IMEC, IPREM, KK Wind Solutions, LBL Berkeley, LINAK, Lodam, NanoGune, OJ Electronics, Phi-Stone, Polyteknik, Stensborg, TU Dresden, TU Graz, UAM Madrid, University Milano Bicocca, UPMC Paris, and Vestas.

 

 


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