Zeiss ORION NanoFab Helium Ion Microscope combines He+, Ne+ and Ga + focused ion beams for imaging and nanofabrication. It has ultra-high resolution (0.4 nm with He+ beam), large focus depth and high surface sensitivity. Charge compensation for imaging electrically-insulating samples is provided with an electron flood gun. The instrument covers both micro- and nano-machining applications.
It is currently used for imaging and nanofabrication in a broad range of material systems. Further information can be found on our homepage: https://www.sdu.dk/en/om_sdu/institutter_centre/c_nanosyd/forskningsomrader/nano_micro+fabrication/orion
Below are images a) of the Zeiss ORION NanoFab Helium Ion Microscope installed at MCI/NanoSyd, B) of ZnO crystals imaged with Helium Ion beam.
